Chemical Vapor Deposition of Polycrystalline Silicon in a Rapid Thermal Processor
نویسندگان
چکیده
منابع مشابه
Hot-wire chemical vapor deposition for epitaxial silicon growth on large- grained polycrystalline silicon templates
We investigate low-temperature epitaxial growth of thin silicon films by HWCVD on Si w1 0 0x substrates and polycrystalline template layers formed by selective nucleation and solid phase epitaxy (SNSPE). We have grown 300-nm thick epitaxial layers at 300 8C on silicon w1 0 0x substrates using a high H :SiH ratio of 70:1. Transmission electron microscopy confirms that the 2 4 films are epitaxial...
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ژورنال
عنوان ژورنال: MRS Proceedings
سال: 1989
ISSN: 0272-9172,1946-4274
DOI: 10.1557/proc-146-97